Quantum chemistry based statistical mechanical model of hydrogen desorption from Si(100)-2-*1, Ge(100)-2*1, and SiGe alloy surfaces
Article Abstract:
The study presents a model for temperature programmed desorption (TPD) of hydrogen from the Si(100)-2*1, Ge(100)-2*1, and SiGe alloy surfaces. It concludes that although the TPD spectra simulated according to the preparing mechanism are consistent with the near-first-order kinetics observed experimentally on the Si(100)-2*1, Ge(100)-2*1 surfaces, hydrogen desorption via interdimer mechanisms results in peak temperatures more consistent with experiments.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
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Effect of a methyl-protecting group on the adsorption of pyrrolidine on Si(100)-2 x 1
Article Abstract:
Placing a methyl-protecting group on a simple amine, pyrrolidine significantly raises the barrier for cleavage at the N atom and thus prevents its dissociative chemisorption to the Si(100)-2 x 1 surface. Initial adsorption occurs by barrierless formation of a dative bond between the nitrogen lone pair and the electrophilic atom of the Si dimer for both compounds.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2001
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Reactions of nitriles at semiconductor surfaces
Article Abstract:
Density functional theory with cluster models is used to investigate the chemistry of nitrile compounds on the Si(100)-2 x 1 and Ge(100)-2 x 1 surfaces. The energetics for the surface reactions of acetonitrile, 2-propenenitrile, and 3-butenenitrile is calculated.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
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