Reactive species generated during wet chemical etching of silicon in HF/HNO3 mixtures
Article Abstract:
The role of intermediate species generated during wet chemical etching of silicon in a HF-rich HF/HNO3 mixture is studied by spectroscopic and analytical methods. Performing of experiments at 1 degree Celsius leads to stabilization of nitrogen intermediate species due to reduction of nitric acid and as the etch rate lowers, the reaction heat can be removed from the silicon surface more efficiently, leading to a better controllability of etching.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2006
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Highly ordered chevron-shaped arrays of continuous copper nano-dot lines formed by electroless deposition on hydrogen-terminated Si(111) surfaces
Article Abstract:
Highly ordered chevron-shaped arrays of continuous copper nano-dot lines are formed by electroless deposition on hydrogen-terminated Si(111) (H-Si(111)) surfaces. The results have indicated that designed ordered metal nanowires can be produced by the electroless deposition method by using H-Si(111) surfaces with well-regulated step lines as a substrate.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2006
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