Surface interactions of NH2 radicals in NH3 plasmas
Article Abstract:
A study investigated the interactions of NH2 with Si, SiO2, Si3N4, polyimide, poly(tetrafluoroethylene) and Pt surfaces using 100% NH3 and SiH4/NH3 plasma molecular beams. NH2 was generated at the surface of all these substrates save polyimide during processing with a 100% NH3 plasma, and the surface loss coefficients for the NH2 radicals were measured. Experimental methods and findings are presented.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 1999
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Surface treatment and doping dependence of In2O3 nanowires as ammonia sensors
Article Abstract:
Ammonia gas via electrical measurements at room temperature is detected by using devices based on single-crystalline In2O3 nanowires. It is observed that the performance of In2O3 nanowires as NH3 sensors is affected by both the doping concentration and the surface preparation. Results reveal that In2O3 nanowires has significant potential as chemical sensors.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
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Mechanisms and energy transfer for surface generation of NH2 during NH3 plasma processing of metal and polymer substrates
Article Abstract:
A demonstration that NH2 radicals are generated at the substrates surface during ammonia plasma processing for a variety of substrate materials is presented. Different types of substrates were studied while applied rf power, P, was varied between 50 and 175 W.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2001
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