UHV study of hydrogen atom induced etching of amorphous hydrogenated silicon thin films
Article Abstract:
Flat-panel displays and solar cells are fabricated with the use of amorphous hydrogenated silicon (a-Si:H). It is found that at higher temperatures, the etching rate decreased due to instability of higher hydrides and completing silicide formation processes.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2001
Semiconductors and related devices, Semiconductor and Related Device Manufacturing, All Other Basic Inorganic Chemical Manufacturing, Thin Film Materials, Industrial inorganic chemicals, not elsewhere classified, Silicon, Analysis, Thin films, Optical properties, Dielectric films
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2001
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Interaction of molecular and atomic hydrogen with a V(100) + S surface
Article Abstract:
The kinetics of adsorption and absorption of atomic hydrogen on a sulfur-covered V(100) surface is studied using thermal desorption spectroscopy. Further, the dynamics of hydrogen desorption from V(100) surface is examined by laser spectroscopy.
Publisher: American Chemical Society
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2001
Usage, Laser spectroscopy
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2001
User Contributions:
Comment about this article or add new information about this topic:
Subjects list: Research, Hydrogen, Chemistry, Physical and theoretical, Physical chemistry, Atomic properties
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