Controlling static charge in spin rinser dryers
Article Abstract:
Static charge generated in spin rinse dryers (SRDs) could be placed under control by providing electrical path for the charge to slowly drain to the ground. Such path would prevent static charge-related events, which is generated in the highest levels in SRDs though it is also generated inside most semiconductors. Ionization of the nitrogen used for drying is the selected method in an SRD, where the offending charge is on isolated and suspended wafers. SRD ionization guidelines include reliability and maintenance, compressed gas ionizer, cleanliness and alarm indicators.
Comment:
Static charge generated in spin rinse dryers could be control by providing electrical path for charge to slowly drain to ground
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1998
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The challenges of the copper CMP clean
Article Abstract:
OnTrack Systems Inc., a subsidiary of Lam Research Corp., has developed a new cleaning formulation for use in copper CMP cleaning. Copper CMP poses a unique set of challenges to the CMP cleaning process but company officials stated that the MCC solution does the job because it allows brush scrubbing to be successfully used for copper CMP cleaning. The new cleaning formulation utilizes the zeta potential concept to control the removal of slurry from the water surface while prohibiting the slurry from accumulating in the PVA brushes.
Comment:
Developes a new cleaning formulation for use in copper CMP cleaning
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1998
User Contributions:
Comment about this article or add new information about this topic:
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