Track systems meet throughput and productivity challenges

Article Abstract:

The track industry's innovations during the past years have been centered on meeting challenges that include throughput, thermal management and time and synchronization issues. Existing high-throughput tracks are capable of running anywhere between 75-85 wafers/hour, a significant improvement from 40-50 three years ago. Photoresist track companies are also stepping up efforts to improve wafer transport timing within the system. Resist reduction is also one of the areas that concerns track suppliers, resulting in the rapid evolution from one platform to another.

Comment:

Track ind's innovations focus on meeting challenges involving throughput, thermal management & time & synchronization issues

United States, Product information, Photographic Film, Paper, Plate, and Chemical Manufacturing, Photo Resists, Photoresists, Article

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Flow development center to shorten technology integration

Article Abstract:

Applied Materials Inc of Santa Clara, CA, unveiled its Equipment and Process Integration Center (EPIC) that provides off-site integration, which can reduce capital expenditure by enabling equipment to be installed nearer the start of manufacturing. EPIC, which houses Applied's copper-based technologies, will combine Fab300 and Workstream DFS manufacturing execution systems from Consilium.

Semiconductor and Related Device Manufacturing, Facilities & equipment, California, Semiconductor Devices

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