PARIS II Version 1.0
Article Abstract:
Technical Database Services' PARIS II Version 1.0 incorporates a set of advanced solvent design algorithms that were developed at the environmental Protection Agency's (EPA) National Risk Management Research Laboratory. Included are the complete AIChE DIPPR 801 Database of physical property data for 1,685 chemicals, over 4,000 UNIFAC parameters and estimation programs from the Technical University of Denmark, and environmental health and safety data from EPA and other sources. The program creates a ranked list of candidates for which users can select solvents that will meet performance requirements within set environmental tolerance limits.
Publication Name: Chemical Engineering Progress
Subject: Engineering and manufacturing industries
ISSN: 0360-7275
Year: 2000
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AXSYS 1.0
Article Abstract:
Hyprotech's AXSYS 1.0 is a software that integrates process simulation and project evaluation data in a common database repository. It also provides a comprehensive front-end process-design environment with integrated links to HYSYS and AspenPlus process simulators, cost-estimating applications, and heat exchanger design packages, and seamless integration with Excel and other standard desktop applications for data entry and analysis. Hence, its application optimizes enterprise workflow and enables collaborative engineering and early validation of plant designs.
Publication Name: Chemical Engineering Progress
Subject: Engineering and manufacturing industries
ISSN: 0360-7275
Year: 2000
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ASPECT P&ID with Microsoft Visio 2000
Article Abstract:
Cadcentre's Microsoft Visio 2000 provides users with full graphical capability for constructing piping and instrumentation diagrams (P and IDs) with all associated rules and representations. The software can also be used to create a logical connectivity model of the plant with equipment list, line list, and instrument list reports. Furthermore, the functional information from P and IDs generated by the software can be used and validated in to a two-dimensional continuous logical plant model.
Publication Name: Chemical Engineering Progress
Subject: Engineering and manufacturing industries
ISSN: 0360-7275
Year: 2000
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