All-silica integrated optical components

Article Abstract:

A technique for making all-silica waveguides has been developed. The Microwave Plasma Assisted Chemical Vapour Deposition (MPACVD) technique offers various capabilities, with the multimode waveguides achieving very large material deposition rates. Optical-fibre networks rely on passive optical components for distribution functions, with the new fabrication technique addressing the needs of inexpensively mass-producing high performance passive optical splitters. Integrated optical waveguide structures clad in germania doped silica are made on silica substrate via the new process.

Usage, Innovations, Silica, Optical waveguides, Silicon dioxide, Integrated optics

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Discussion on the use of optical amplifiers in IM-DD receivers

Article Abstract:

Recent research has looked at the performance of optically preamplified Intensity Modulated Direct Detection (IM-DD) receivers, particularly considering sensitivity and bit error rate. The research used a statistical model which gives greater accuracy than the usual Gaussian estimates. It was found that system degradation can be at very low levels for practical receivers, in cases where the decision threshold is based on a fixed percentage of the eye pattern opening, instead of being re-optimised for any given value of the received optical power.

Other Communications Equipment Manufacturing, Fiber Optics Systems & Equip, Communications equipment, not elsewhere classified, Fiber optic networks, Optical communications technologies, Optical communications

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Three-dimensional patterning technology for the fabrication of complex micro-components

Article Abstract:

Researchers at GEC-Marconi Infra-Red have over recent years been looking at three-dimensional patterning technology for the production of complex micro-components. It has been possible to use an innovative mask process to produce complex micro-relief structures in positive photoresist which can be transferred into a number of materials using the company's dry-etch techniques. This process could also prove useful in other fields where sub-micron control of three-dimensional features is needed.

Photoresists

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