Atomic layer deposition of amino-functionalized silica surfaces using N-(2-Aminoethyl)-3-aminopropyltrimethoxysilane as a silylating agent
Article Abstract:
A study was conducted to investigate whether aminosilylated silica surfaces can also be prepared by using N-(2-aminoethyl)-3-aminopropyltrimethoxysilane (AAPS) as a precursor by atomic layer deposition (ALD). The result shows that the polymerization reaction is assumed to take place in the horizontal direction, and the modification of porous silica can be further applied for the thin film deposition processes on planar or curved substrates.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
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Surface reactivity of OH molecules during deposition of SiO2 from siloxane-based plasmas
Article Abstract:
A study was conducted to investigate the relative gas-phase concentration and surface reactivity of OH in the SiO2 deposition plasma systems, of 1,3,5,7-tetramethylcyclotetrasiloxane/oxidant (TMCTS/O2(N2O)) and dimethyldimethoxysilane/oxidant (DMDMOS/O2(N2O)). The result indicates that OH participants in SiO2 film deposition and contributes to hydrocarbon removal, precursor fragmentation, and surface silanol formation.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
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Dedicated global optimization search for ground state silica nanoclusters: (SiO2)(sub N) (N = 6-12)
Article Abstract:
A study was conducted to investigate the exponentially increasingly complex phase space of (SiO2)(sub N) nanoclusters for N = 6-12. The result shows that these structures are lower, or at most equal in energy to all other correspondingly sized structures previously reported in the literature.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
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