Photocatalytic decomposition of alcylsiloxane self-assembled monolayers on titanium oxide surfaces
Article Abstract:
The atomic force microscopy (AFM) is used to study the photocatalytic decomposition of octadecyltrichlorosilane (OTS) based self-assembled monolayer formed on TiO2. The reactive oxidizing species attack the alkyl radicals on the TiO2 surface producing alkoxy radicals and carbonyls.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
User Contributions:
Comment about this article or add new information about this topic:
Reduction of incubation period by employing OH-terminated Si(001) substrates in the atomic layer deposition of Al2O3
Article Abstract:
The phenomenon of low initial growth rates in atomic layer deposition (ALD) of various oxides on HF-treated substrates can be effectively avoided by use of OH-terminated SI(001) substrates. The effect of reducing the incubation period is confirmed in the ALD process of aluminum oxide thin films in which trimethylaluminum and water are used as sources of aluminum and oxygen.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
User Contributions:
Comment about this article or add new information about this topic:
- Abstracts: Epitaxial ZnS thin films grown by single source chemical vapor deposition. Structure-evolution in chemical vapor-deposited ZnS films
- Abstracts: Clarification of phase separation mechanism of sodium borosilicate glasses in early stage by nuclear magnetic resonance
- Abstracts: 3D carbon nanotube architectures on glass substrate by stamp printing bimetallic Fe-Pt/polymer catalyst. Patterned growth of well-aligned carbon nanotubes: a soft-lithographic approach
- Abstracts: Time-resolved fluorescence quenching measurements of the aggregation numbers of normal sodium alkyl sulfate micelles well above the critical micelle concentrations
- Abstracts: Opposite charges in work function of high index copper surfaces with surface acoustic wave propagation. Infrared characterization of Rh surface states and their adsorbates during the NO-CO reaction