X-ray absorption spectromicroscopy studies for the development of lithography with a monomolecular resist
Article Abstract:
Soft X-ray absorption microscopy was applied to image and characterize molecular patterns produced by electron irradiation of aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs) on Au substrates. The X-ray absorption microspot spectra derived from different areas of the SAM patterns provided specific chemical information on pristine and irradiated areas and unexpected features in these patterns.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2005
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Self-assembled monolayers of alkaneselenolates on (111) gold and silver
Article Abstract:
Self-assembled monolayers (SAMs) formed from didodecyl diselelenide (C12SeSeC12) and didodecyl selelenide (C12SeC12) on (111) gold and silver substrates were characterized by high-resolution X-ray photoelectron spectroscopy and ellipsometry methods. C12SeSeC12 was found to form contamination-free, densely packed, and well ordered SAMs on both substrates.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2005
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Imaging and patterning of monomolecular resists by zone-plate-focused X-ray microprobe
Article Abstract:
Soft X-ray scanning photoelectron microscopy (SPEM) is used to image and characterize molecular patterns produced by electron irradiation of various aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs). The capabilities of SAMs technique both for chemical imaging and as a fabrication tool for micro- and nanolithography are demonstrated.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2003
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