New lithographic processes evolve as design rules shrink
Article Abstract:
Manufacturers of semiconductor production equipment continue to develop other lithographic processes that can handle increasingly thin design rules. These devices include argon-fluoride lasers, electron beams and X- rays, which are being improved for lithographic processes that will be suitable for 1GB to 16GB semiconductor and logic devices. Meanhwile, nine companies have formed the Assn of Super-Advanced Electronic Technologies dedicated to developing advanced element technologies for process finer than the 0.18um rule.
Publication Name: Journal of the Electronics Industry
Subject: Electronics and electrical industries
ISSN: 0385-4515
Year: 1999
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MOS ICs show 1st-quarter slip in production
Article Abstract:
The Semiconductor International Capacity Statistics has reported that MOS IC production capacities declined by 0.9% to 1,475,200 units per week in 1st qtr 1999, in terms of six-inch conversion equivalents, compared to 4th qtr 1998. However, output efficiencies for MOS ICs overall increased by 2.6% to 85.5% in 1st qtr 1999. The figures, however, reflect a 6.7% decline for MOS ICs using 0.7 micrometers or larger design rules, with output reaching 466,000 units per week.
Publication Name: Journal of the Electronics Industry
Subject: Electronics and electrical industries
ISSN: 0385-4515
Year: 1999
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Market for computer servers regains momentum
Article Abstract:
The personal computer server market is predicted to grow by 20% to 30% in 1999 after a weak market a year ago, according to a leading Japanese manufacturer and industry analysts. The optimistic forecast is based on several factors, including near completion of businesses on their solutions to the year 2000 computer (Y2K) problem and new releases of hardware and software products that are Y2K compliant.
Publication Name: Journal of the Electronics Industry
Subject: Electronics and electrical industries
ISSN: 0385-4515
Year: 1999
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