Scrubbing takes a new role
Article Abstract:
Peralta, NM-based Atmospheric Physics Inc has developed the Cloud ChamberScrubber, a wet scrubbing technology licensed by Tri-Mer Corp of Owosso, MI. The new technology deviates from the commonly used wet ESP technology in that the ESP system uses high electrical power input that moves a single particulate close to the collect wall wiwth a distance of four to six inches while Cloud Chamber moves a single particulate for collection by only 10 microns. The Cloud Chamber Scrubber also eliminates the necessiity of separatingd ventilation ducts for caustic and acid gases.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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Laser technique cleans polymers
Article Abstract:
Chartered Semiconductor Manufacturing Inc of Singapore has come up with a non-contact, dry laser-cleaning technology that can eliminate etch-induced polymers at fluences. This is accomplished with lesser possibility of damaging the surrounding areas of the wafer. Aside from eliminating problems of toxic chemicals and waste disposal, laser technology also offers the advantage of functionality at any point of the production line.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1999
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Controlling sodium contamination in cleanrooms
Article Abstract:
CRMC of Marseille Cedex, France, and LETI of Grenoble Cedex, France, found a solution to control sodium contamination in cleanrooms. To reduce airborne sodium deposition, silicon wafers should be stored for periods no longer than one week. The wafers should be protected with conventional storage boxes, far from human activity. Sodium deposition also occurred only during DI water rinses.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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