Trends in wafer cleaning

Article Abstract:

Dry cleaning techniques such as laser, aerosols and ozonated chemistries are being developed in conjunction with the improvement of wet methods. The development is being driven by requirements of more stringent device specifications, environmental concerns and the move to new materials. The move to new materials is also paving the way for the advancement of new cleaning solutions. For instance, Campbell CA-based ProSys has developed a new technique. By exciting ceramic piezoelectric crystals with a high-frequency AC voltage, the resulting vibrations generate an acoustic wave that serves the cleaning mechanism.

Comment:

Dry cleaning techniques such as ozonated chemistries are being developed due needs of more stringent device specifications

Silicon Wafers, Semiconductor wafers, Article

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SiC supports blue LEDs and more

Article Abstract:

Sapphire or silicon carbide (SiC) is still being debated for its potential usage as an alternative material to support blue light emitting diodes (LEDs) and lasers that presenly depend on gallium nitride (GaN). The use of SiC is being considered because of its homoepitaxial attributes and good thermal conductivity. Companies such as Hewlett Packard and Nichia Chemical have successfully employed sapphire as a substrate.

All Other Basic Inorganic Chemical Manufacturing, Light Emitting Diode Displays, Silicon Carbide, LEDs, Silicon carbides

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