Yield enhancement through photosabilization
Article Abstract:
Boston, Mass.-based Easton's Fusion Systems Division (FSD) process technology group has developed a new photostabilization process, which is commonly referred to as PK, PhotoKinetics. The new process, which enhances and strengthens post-deep UV lithography features, will allow improved CD control and etch selectivity of deep UV resists. Industry analysts, who have said that the semiconductor business is not yet fully transitioned to deep UV photoresist technology, explain that the PK process takes place at the end of the lithograph sequence.
Comment:
Easton's Fusion Systems Division process technology group has developed a new photostabilization process
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1998
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Wastewater treatment technology
Article Abstract:
Sunnyvale, CA-based Microbar Inc. has launched a proprietary polymer process that allows selective filtration of both suspended and dissolved contaminants for semiconductor fabs. The EnChem process, which utilizes CMP fluorinated chemistries or copper interconnects, can reduce water usage during the semiconductor manufacturing process by as much as 855 through reclaim. The technology also surpasses the industry standard for wastewater process treatments by removing more than 99.7% of contaminating materials at a lower cost.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1998
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Modules are in, but supertools endure
Article Abstract:
Rudolph Technologies Inc of Flanders, NJ, has introduced its new Rudolph S200 system which uses a proprietary multi-angle laser ellipsometer for thin films. The system adopts a modular approach called matrix metrology which customizes a tool to meet measurement requirements. The Rudolph S200 ellipsometer is also very sensitive to etch-to-zero applications and tolerant of refractive index changes in underlying materials. It can also be combined with a spectroscopic reflectometer.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1999
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