Etching behavior of silicon nanowires with HF and NH4F and surface characterization by attenuated total reflection Fourier transform infrared spectroscopy: Similarities and differences between one-dimensional and two-dimensional silicon surfaces
Article Abstract:
The etching behavior of one-dimensional (1-D) Si nanowires (SiNWs) in various HF and NH4F etching solutions is reported. The similarities and differences of the etching behaviors and the resulting surface speciations between the 1-D SiNWs and the 2-D Si wafers suggest that the nanoscale structures as well as the low dimensionality of SiNWs might have contributed to the rapid hydrolysis of the surface Si-H(sub x) species in NH4F solutions, especially at high pH values.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2005
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Chemisorption of NO2 at boron sites at the surface of nanostructured mesoporous silicon
Article Abstract:
The study brings evidence in favor of the mechanism by studying the IR spectra of the system at different NO2 equilibrium pressures. It concludes that estimation of the enthalpy of adsorption suggests that a chemisorption process is involved, which is confirmed by the kinetics having desorption being lower than that of adsorption.
Publication Name: Journal of Physical Chemistry B
Subject: Chemicals, plastics and rubber industries
ISSN: 1520-6106
Year: 2004
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