Defect detection overcomes limitations

Article Abstract:

Defect detection in the semiconductor industry, once confined to purely optical techniques, had adopted new methodologies with the development of new materials with no optically detectable defects. This has resulted in a move towards the proliferation of SEM inspection equipment that not only detect these minute defects but also aid in design development. This has prompted a change in the traditional view of defect detection equipment as no more than non-value-added expenditures.

Product information

---

Optical microscopy at sub-0.1 um resolution: fiction or vision?

Article Abstract:

Optical microscopy at under 0.1 micrometer resolution for the semiconductor industry is very much possible through UV/DUV microscopy. The general procedure for using the technique theoretically exist but designing a working equipment and applying it remains a speculative endeavor. The highest degree of certainty remains with super-resolution methodologies where improved visualization and contrast will be the minimum gains.

Manufacturing processes

---

Similar abstracts:

• Abstracts: Executive suite: compensation's up, size is down, at utility boards. Global power: a surge in the current
• Abstracts: Why competition won't eliminate co-ops. Utilities shopping their CISs. UTC '95 to assess utility communications networks, telecom-market possibilities
• Abstracts: Fujitsu ten releases CD-related lineup. MiniDisc revolution takes hold with latest round of releases
• Abstracts: Control of metal outplating from HF solutions. Trends in wafer cleaning. Motorola to open Polish fab
• Abstracts: XR system crosses the line into superior-resolution images. AV-21F90 flatcolor TVs

This website is not affiliated with document authors or copyright owners. This page is provided for informational purposes only. Unintentional errors are possible.