Lens performs full-color optical switching
Article Abstract:
DigiLens of Sunnyvale, CA, has successfully developed a diffractive lens that is capable of full-color optical switching. Its invention is considered a breakthrough for its switching capability is 10 times faster than electrical switching. Applications of the diffractive lens include creative capturing and routing of light in measurement and detection systems, displays, telecommunications and imaging systems.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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Reticle defect review faces new demands
Article Abstract:
The mask repair technology industry is facing new challenges with demands for enhanced defect printability and improved accuracy of defect review decisions. The traditional method for the analysis of defect printability has been aerial image measurement systems which is a manual technique that requires time to change optics and illumination source. Therefore, a software, called printability simulation software, has been developed as an alternative to AIMS. However, the questionable accurate prediction of defect printability has led to the conclusion that a fast aerial image tool would be the ideal defect review system for reticles.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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Optical lithography: 100 nm and beyond
Article Abstract:
Optical lithography researchers, such as those at the University of Texas at Austin and IBM's Almaden Research Center in San Jose, are exploring new polymers that may assist in the development of 193 nm photoresists. These new polymers are grouped into two main categories, cyclic olefin and acrylic polymers. Cyclic olefin polymers, according to researchers at the IBM facility, appear to have better etch properties compared with other polymers. Some industry analysts believe that new research will extend the life of optical lithography to the year 2015.
Comment:
Has been exploring new polymers that may assist in the development of 193 nm photoresists in the area of optical lithography
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1998
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