Pursuing the perfect low-k dielectric
Article Abstract:
Industry analysts were surprised by the decision by Motorola Inc. and International Business Systems Corp. to use copper interconnects rather than low-k materials, which is believed to be more enabling than copper. Low-k dielectrics, which reduce cross-talk noise, decrease line-to-line capacitance and lessen power dissipation problems, were not used by IBM and Motorola because copper is anticipated to offer lower manufacturing costs. The companies were also worried about problems with integrating and achieving a new low-k in production devices.
Comment:
Has decided to use copper interconnects rather than low-k materials, which is believed to be more enabling than copper
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1998
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Low-k dielectrics: will spin-on or CVD prevail?
Article Abstract:
The usage of low-k dielectrics has been spurred with the declaration of IBM that it will use SiLK in its 13 micron process and that Texas Instruments would use Applied Materials' Black Diamond CVD process with copper. Other proponents of CVD include LSI Logic and Sony. Supporters of CVD techniques say they are able to reuse existing toolsets and are able to realize simpler integration due to the structure of CVD siloxanes which are similar to silicon dioxides.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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Striking a compromise between good and perfect silicon
Article Abstract:
Debates on the level of purity control needed to start silicon wafers continue to preoccupy the industry. For instance, different methods of producing ultra-high-quality silicon at reduced costs were presented during the Silicon Wafer symposium at SEMICON West. Robert Falster, silicon materials research director of Novara, Italy-based MEMC Electronic Materials, pushed for the simplification of materials selection processes during a recent SEMI symposium.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1999
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