EUV edging out rivals as next-generation IC fab tool
Article Abstract:
A cooperative effort by researchers at Sematech, Lawrence Livermore National Laboratory and the branch of sandia national Laboratories in Livermore, CA, shows promise of keeping the semiconductor industry on track with Moore's Law. Microchip makers will need, by 2005, a next-generation lithographic method for building smaller integrated circuits (IC) if they to keep up with that law that states that the number of transistors on an IC doubles every 18 to 24 months. The research involves extreme ultraviolet (EUV) lithography.
Publication Name: IEEE Spectrum
Subject: Engineering and manufacturing industries
ISSN: 0018-9235
Year: 2001
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Biological warfare canaries: in the face of germ warfare, just knowing you are under attack is half the battle
Article Abstract:
Early-warning detector systems are being developed to guard against biological weapons such as bacteria, viruses, or toxins spread deliberately in air, food, or water. An ultimate dream solution is described as a wristwatch-sized device capable of rapid detection and diagnostics, and even treatment.
Publication Name: IEEE Spectrum
Subject: Engineering and manufacturing industries
ISSN: 0018-9235
Year: 2001
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Dawn of test e-bomb
Article Abstract:
High-power microwave (HPM) weapns generate powerful pulses of electromagnetic waves in the microwave frequency band. Such weapons can be used to disrupt or destroy electrical and/or electronic circuitry.
Publication Name: IEEE Spectrum
Subject: Engineering and manufacturing industries
ISSN: 0018-9235
Year: 2003
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