Surface melting of octamethylcyclotetrasiloxane confined in controlled pore glasses: Curvature effects observed by [super 1]H NMR

Article Abstract:

The [super 1]H NMR investigation is employed to measure the thickness of the pre-molten surface layer formed at the interface of octamethylcyclotetrasiloxane (OMCTS) to the matrix in controlled pore glasses with different pore diameters. The study reveals that the surface layer thickness highly depends on the curvature of the pore wall and the solid-liquid interface, as OMCTS itself is a weakly polar molecule with close to spherical shape.

Nuclear magnetic resonance, Monomolecular films, Melting points, Melting, Methyl groups, Methyl compounds, Report

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LO-TO splittings in plasma-deposited siloxane films

Article Abstract:

The occurrence of LO-TO splittings of lattice vibrations in siloxane and carbosilane networks deposited by plasma-enhanced chemical vapor deposition (PECVD) is reported. The polysiloxane like structures can have high concentration of Si-O-Si groups and, as in v-SiO2, can give rise to the observation of LO-TO splittings of Si-O-Si related bands.

Chemical vapor deposition, Chemical vapour deposition, Plasma physics

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Berreman effect in amorphous and crystalline WO3 thin films

Article Abstract:

The effects on annealing treatment on WO3 thin films deposited by HFMOD by means of XRD, Raman, and infrared reflection -absorption spectroscopies are investigated. The results signal the applicability of the Berreman effect to the phase characterization of metal -supported WO3 films.

Semiconductors and related devices, Semiconductor and Related Device Manufacturing, Thin Film Materials, Influence, Phase transformations (Statistical physics), Phase transitions (Physics), Thin films, Dielectric films, Absorption spectra

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