Matsushita builds plant for large TFT LCDs
Article Abstract:
Matsushita Electric Industrial Company Ltd has built a facility for liquid crystals within its Ishikawa Works plant. The C1 facility has 34,000 sqm of floor space and manufactures thin-film transistor LCD panels for monitors. Its capacity is 90,000 panels monthly and commercial production is expected to start in Aug 2000. A C2 facility will begin operations in 2001 and a C3 plant will operate in 2002. The firm spent Y32 billion in building the LCD facility.
Publication Name: Journal of the Electronics Industry
Subject: Electronics and electrical industries
ISSN: 0385-4515
Year: 1999
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FASL constructs 3rd large fab for flash memories
Article Abstract:
Fujitsu AMD Semiconductor Ltd expects to finish its $1.5 billion facility at the Aizu-Wakamatsu compound in Japan by Dec 2000. The plant, which is dubbed as the third largest fab for flash memories, offer more than 100,000 square feet of clean room space. It has sufficient capacity to produce 7,500 eight-inch wafer each week. The facility is expected to be ready for production by the second half of 2001.
Publication Name: Journal of the Electronics Industry
Subject: Electronics and electrical industries
ISSN: 0385-4515
Year: 2000
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Communications prospects prompt Sumitomo's wafer efforts
Article Abstract:
Sumitomo Chemical Company Ltd will manufacture 4- and 6-in epitaxial wafers from gallium-arsenide materials at its factory in Chiba, Japan. The plant has an annual production capacity of 100,000 wafers. The wafers will be made using a metal organic chemical vapor deposition process. According to the company, the demand for the wafers will mostly come from the mobile communications equipment sector.
Publication Name: Journal of the Electronics Industry
Subject: Electronics and electrical industries
ISSN: 0385-4515
Year: 1999
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Comment about this article or add new information about this topic:
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