Taking a new approach to copper ECD bath management
Article Abstract:
A system called Copper Bath Integrated System has been developed to address the issues related to disposal of hazardous and non-hazardous residue. The system is based on a remove-and-reconstitute approach.A proprietary copper abatement system has also been created to remove copper from the plating rinsewater steram and traet any waste generated by the organics regeneration process itself. The remove-and-reconstitute approach has been proven to have several advantages over previous modes of plating bathmanagement. It eliminates the costly treatment of waste copper and acid and maintains cleaner and more repeatable bath chemistry.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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Improving yield with protective ceramics
Article Abstract:
New materials in the semiconductor industry are being developed to replace silicon oxide because gate oxide thicknesses are approaching their limits. Two materials considered the most promising, tantalum oxide and titanium oxide are known to have considerable defect densities. Protective ceramics have been shown to provide higher potential since they can be processed into thin films with low defect densities. A number of metal oxides are examined based on their Pilling-Bedworth ratio for use as gate dielectric materials.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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A better way of reducing monitor costs
Article Abstract:
Intel Corp and KLA-Tencor have developed a system for cutting production costs through improved monitoring and control of random defect excursions. It uses defect, yield and financial inputs in advanced statistical and stochastic models. KLA-Tencor's Sample Planner gives a dynamic assessment of monitor needs and reduction possibilities as they are transformed due to process maturity and yield learning.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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