Design and validation of 0.25 micrometer integrated circuit yield model

Article Abstract:

SEMATECH's new yield model is the first to present industry tool targets derived from real manufacturing data and used to provide validated defect density targets for a 0.25 micrometer process tool set. The company has already developed several yield models in the past and much has been learned from these efforts which is now being applied to the new yield model. SEMATECH's new yield model uses information gathered from many sources to forecast validated particles per wafer pass specifications for a 0.25 micrometer logic process.

Comment:

Its new yield model is the first to give ind tool targets & provides defect density targets for 0.25 micrometer process tool set

Product information, Article, SEMATECH

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Optical lithography: 100 nm and beyond

Article Abstract:

The move to go beyond 100 nm linewidth in the manufacture of semiconductor devices using optical lithography techniques will require the existence of an infrasture that is capable of supporting the necessary resolution enhancement technologies. This insfrastructure must also be capable of increased data handling due to optical proximity correction and phase shift mask. This development will require greater cooperation between researchers and chip makers.

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