Single-wafer processing: soon to be reality?
Article Abstract:
Progress is being achieved in the development of single-wafer processing under a joint development project between Applied Materials Inc and Lucent Technologies. The process was initially promoted a method to address cost and cycle time issues. It became a reality when Texas Instruments successfully concluded its Microelectronics Manufacturing Science and Technology contract in 1993. Lucent intends to use Applied's single-wafer front-end process technology to possible uses in its next-generation process flow.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 2000
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IBM advance spurs "system-on-a-chip"
Article Abstract:
International Business Machines Corp has formulated a production method that will allow the placement of logic and memory circuits onto a single chip. With the use of copper technology, the approach provides a better alternative to the usual methods that typically compromise logic and memory functions. The method combines copper writing with circuitry of a minimum size of 0.15 micrometer.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1999
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Empty spaces in silicon (ESS): an alternative to SOI
Article Abstract:
Researchers at Toshiba Corp in Yokohama, Japan, have developed an innovative process for forming empty spaces in silicon (ESS). The new technique makes use of the self-organizing migration properties on the silicon surface. The process involves annealing deeply etched silicon substrates in a deoxidizing ambient that results in the migration of silicon atoms on the surface.
Publication Name: Semiconductor International
Subject: Electronics and electrical industries
ISSN: 0163-3767
Year: 1999
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